News & Events

Recently, following a joint evaluation by the World Intellectual Property Organization (WIPO) and the China National Intellectual Property Administration (CNIPA), Moutai Institute was approved as one of the institutions in the second batch of Phase II of the Technology and Innovation Support Center (TISC) program. It is the only higher education institution in Guizhou Province selected in the latest round.

The Technology and Innovation Support Center (TISC) is an important component of the global intellectual property information service network promoted by WIPO. It is designed to provide innovators with comprehensive support in such areas as patent search and analysis, technology transfer, and intellectual property strategy consulting.

The approval marks another important milestone in Moutai Institute’s efforts to strengthen its intellectual property and research support capacity. It follows the Institute’s designation in 2023 as a National Intellectual Property Information Public Service Outlet and adds another national-level platform to support research, innovation, and technology transfer.

“The establishment of a TISC at Moutai Institute will help bridge the “last mile” between the research resources and the commercialization of scientific and technological outcomes,” said an official in charge of research at the Institute.

Moving forward, Moutai Institute will make full use of the national-level platform to provide patent landscaping, the development of high-value patents, and technology matchmaking services for faculty and students, as well as for the local Jiang-flavor baijiu industry chain in Renhuai. These efforts are expected to strengthen the Institute’s research and innovation capacity while supporting technological upgrading across the regional baijiu industry.

First Review  Xueting Zhao

                                                                                                                                                           Second Review  Qing Ma

                            Third Review   Jiangfang Wang